Ti3SiC2-formation during Ti–C–Si multilayer deposition by magnetron sputtering at 650 °C

Ti3SiC2-formation during Ti–C–Si multilayer deposition by magnetron sputtering at 650 °C

Ti3sic2­formation during Ti–c–si Multilayer Deposition by Magnetron Sputtering at 650 °c Original Citation

The University Repository is a digital collection of the research output of the University, available on Open Access. Copyright and Moral Rights for the items on this site are retained by the individual author and/or other copyright owners. Users may access full items free of charge; copies of full text items generally can be reproduced, displayed or performed and given to third parties in any ...

Deposition of Al/Cu Multilayer By Double Targets Cylindrical DC Magnetron Sputtering System

A cylindrical direct current magnetron sputtering coater with two targets for deposition of multilayer thin films and cermet solar selective surfaces has been constructed. The substrate holder was able to rotate around the target for obtaining the uniform layer and separated multilayer phases. The Al/ Cu multilayer film was deposited on the glass substrate at the following conditions: Working g...

Deposition of Multilayer Optical Coatings Using Closed Field Magnetron Sputtering

Closed field” magnetron (CFM) sputtering offers a flexible and high throughput deposition process for optical coatings and thin films required in display technologies. CFM sputtering uses two or more different metal targets to deposit multilayers comprising a wide range of dielectrics, metals and conductive oxides. Moreover, CFM provides a room temperature deposition process with high ion curre...

deposition of al/cu multilayer by double targets cylindrical dc magnetron sputtering system

a cylindrical direct current magnetron sputtering coater with two targets for deposition of multilayer thin films and cermet solar selective surfaces has been constructed. the substrate holder was able to rotate around the target for obtaining the uniform layer and separated multilayer phases. the al/ cu multilayer film was deposited on the glass substrate at the following conditions: working g...